Research Foci & Facilities

Nanotechnology Concentration - Research Foci & Facilities
Nanotechnology Concentration
Nanotechnology Concentration
Nanotechnology Concentration

Research Foci

Chemical and Biomolecular Engineering

Study of nanocatalysts, nanocomposite and nanoporous materials, nanomaterials for environmental applications, atmospheric nanoparticle pollutants, usage of nano-sized magnetic particles and nano-electrocatalysts, morphology / property relationship of polymers at nanoscale, bio-functionalized nanoparticles for diagnostics and biosensing, nanocarriers for drug delivery and nanomaterials for tissue engineering, and nano-biomaterials for treatment of industrial effluents.

Civil and Environmental Engineering

Development of iron-based nanoparticles for the removal of heavy metals from groundwater and industrial wastewater; Polymeric nanocomposites for the surface coating of concrete structures, and fate, transport, transformation and toxicity of manufactured nanomaterials in water.

Electronic and Computer Engineering

Design, fabrication, and characterization of compound semiconductor based nano-electronic devices, integration of compound semiconductor based nano-electronic devices on Silicon, modeling of nano-CMOS devices, nanoscale transistors, nanoelectromechanical system (NEMS); nanosize photoalignment layers, nanoelectronics, nanophotonics, nanoelectronic devices design and fabrication, and system-on-chip and embedded system designs using nanotechnologies.

Mechanical Engineering

Nano precision machining, nanofibers, carbon nanotubes, graphene and organoclay nanoparticles, nanoindentation, applications of nano-particles for printable electronics and nano composites, integrated nano bubble actuator, nanoscale fluid-surface interaction, multiscale mechanics, nanoscale gas transport, micro / nanomechanics, molecular dynamic simulations, thermal interface material, micro fuel cell, and nano-structured materials for lithium ion battery electrodes.


State-of-the-art nanoelectronics processing equipment are installed. These include an E-beam Direct Write System that facilitates sub-quarter-micron patterning and enables nano-structure research. The laboratory has also developed MOS and bipolar base line processes to provide nanoelectronics fabrication at the discrete device and small scale integrated (SSI) circuits level, with the possibility to upgrade to LSI and VLSI level.